Principles of Plasma Discharges and Materials Processing/
Gardado en:
| Autor Principal: | |
|---|---|
| Outros autores: | |
| Formato: | Libro |
| Idioma: | inglés |
| Publicado: |
Hoboken, N.J.:
Wiley-Interscience,
c2005.
|
| Edición: | 2nd ed. |
| Subjects: | |
| Tags: |
Engadir etiqueta
Sen Etiquetas, Sexa o primeiro en etiquetar este rexistro!
|
MARC
| LEADER | 00000nam a2200000 i 4500 | ||
|---|---|---|---|
| 001 | JU-IMPORT-002548 | ||
| 003 | BD-SaJUCL | ||
| 005 | 20260915022210.0 | ||
| 008 | 260915s2005 xx 000 0 eng d | ||
| 040 | |a BD-SaJUCL |b eng |c BD-SaJUCL |e rda | ||
| 100 | 1 | |a Lieberman, Michael A. | |
| 700 | 1 | |a Lichtenberg, Allan J. | |
| 245 | 1 | 0 | |a Principles of Plasma Discharges and Materials Processing/ |c Michael A. Lieberman and Allan J. Lichtenberg |
| 264 | 1 | |a Hoboken, N.J.: |b Wiley-Interscience, |c c2005. | |
| 250 | |a 2nd ed. | ||
| 300 | |a xxxv, 757p. | ||
| 504 | |a Includes bibliographical references and index. | ||
| 650 | 0 | |a Plasma dynamics | |
| 650 | 0 | |a Plasma etching | |
| 650 | 0 | |a Semiconductors -- Etching | |
| 020 | |a 0471720011 | ||
| 082 | 0 | 4 | |a 530.44 |b L71 |2 23 |
| 942 | |c BK |n 0 | ||
| 999 | |c 96107 |d 96101 | ||