Principles of Plasma Discharges and Materials Processing
Kaydedildi:
| Yazar: | |
|---|---|
| Materyal Türü: | Kitap |
| Dil: | İngilizce |
| Baskı/Yayın Bilgisi: |
Hoboken, N.J
Wiley-Interscience
c2005
|
| Edisyon: | 2nd ed |
| Konular: | |
| Etiketler: |
Etiketle
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MARC
| LEADER | 00000nam a2200000 i 4500 | ||
|---|---|---|---|
| 001 | JU-Physics-CONSOLIDATED-001109 | ||
| 003 | BD-SaJUCL | ||
| 005 | 20260920035956.0 | ||
| 008 | 260916s2020 xx 000 0 eng d | ||
| 040 | |a BD-SaJUCL |b eng |c BD-SaJUCL |e rda | ||
| 020 | |a 0-471-72001-1 | ||
| 082 | 0 | 4 | |a 530.44 |b L716p |2 23 |
| 100 | 1 | |a Lieberman, Michael A | |
| 245 | 1 | 0 | |a Principles of Plasma Discharges and Materials Processing |c Michael A. Lieberman and Allan J. Lichtenberg |
| 250 | |a 2nd ed | ||
| 264 | 1 | |a Hoboken, N.J |b Wiley-Interscience |c c2005 | |
| 300 | |a xxxv, 757p | ||
| 336 | |a text |b txt |2 rdacontent | ||
| 337 | |a unmediated |b n |2 rdamedia | ||
| 338 | |a volume |b nc |2 rdacarrier | ||
| 504 | |a Includes bibliographical references and index | ||
| 650 | 0 | |a Plasma dynamics | |
| 650 | 0 | |a Plasma etching | |
| 650 | 0 | |a Semiconductors -- Etching | |
| 942 | |c BK |n 0 | ||
| 999 | |c 113893 |d 113893 | ||